Morphotonics recently attended CIOE 2026 (China International Optoelectronics Exposition), connecting with industry leaders working on the future of AI glasses, AR waveguides and advanced optics manufacturing.
During the 2-day event, our CEO Hugo da Silva and CTO & Co-Founder Jan Matthijs ter Meulen presented how large-area Nanoimprint Lithography can support the transition toward high-volume waveguide production. Global demand for AI and AR glasses are rapidly growing worldwide. This directly related to manufacturers requiring production technologies that combine high throughput, optical precision, consistent yield and lower costs, all at scale. Morphotonics’ Roll-to-Plate (R2P) nanoimprint lithography is specially designed to bring unprecedented patterning precision to display-scale substrates.
Thank you to everyone who joined the presentations and visited Morphotonics at CIOE!
Read more on Morphotonics’ presence at CIOE here.
Learn more about our technology for large-area nanoimprint here.
