Leading Large-Area Nanoimprint Technology
How we unlock precision at scale
Morphotonics’ proprietary Roll-to-Plate nanoimprint technology delivers nanoscale precision over large areas far exceeding wafer size. This enables the scaling of nanostructure fabrication with higher yield, consistency and cost efficiency.
Large-area nanoimprint lithography
via Roll-to-Plate
We imprint micro- and nanostructures directly onto glass, polymers or other substrates, using flexible stamps and UV-curable resins. These structures can serve as permanent optical layers or as precise etch masks for further processing.
Key technological advantages
Nano-micron features across large surfaces
Enables advanced optical and functional performance previously not achievable at large scale.
Compatibility with rigid and flexible substrates
Works on glass, polymers, and other substrates for broad application flexibility.
High pattern fidelity and durability
Ensures consistent quality across entire panels for reliable manufacturing results.
Unmatched cost-efficiency
Reduces production time, material usage, and equipment footprint at high throughput
Connect with our nanoimprint specialists
With deep expertise in nanoimprint technology, our experts deliver proven answers to demanding manufacturing requirements.
Access solutions built on proven precision and scalability.
How does our technology compare?
By integrating volume production benefits of Roll-to-Roll nanoimprinting with advanced replication abilities of wafer-scale UV-based Nanoimprint Lithography, Morphotonics’ large-area nanoimprint technology allows for efficient volume production at high quality.
Wafer UV-NIL
Low throughput
High-cost
Small-size substrate
High (position) accuracy
Large-area nanoimprinting
High throughput
Low-cost
Small & large size substrates
High accuracy & pattern freedom
Large-area photolithography
High throughput
Low-cost
Small & large size substrates
Limited pattern choice