Morphotonics develops and supplies its UV imprint materials based on long-standing know-how.
Our UV imprint materials can either be used as a permanent or sacrificial layer (etch resist), that can vary from hard coatings to resins with a low shrinkage to resins with higher Refractive Indices.
We do however only use solvent-free resins, differing from the wafer-based NIL methods. We have an active resin development program and continuously study different components and resin formulations since the UV imprint material properties have a defining impact on the imprinted product quality and durability.

nanoimprint nil resist properties high low refractive index viscosity etch