Nanoimprint Lithography (NIL) is a method of fabricating nanometer-scale patterns. It is a simple nanolithography process with low cost, high throughput, and high resolution. It creates patterns by mechanical deformation of imprint resist by a master texture (mold of stamp) and subsequent solidification processes. The imprint resist is typically a monomer or polymer formulation that is cured by heat or UV light during the imprinting. Adhesion between the resist and the template is controlled to allow proper release. (Wikipedia)