R2P NANOIMPRINT MACHINES

From lab to fab

Nanoimprint equipment:

Morpho Portis

This stand-alone roll-to-plate nanoimprint machine is ideal for Research and Development, process development and pilot production of micro and nanostructures.

Integrated Production Line:

Aurora

This state-of-the-art roll-to-plate nanoimprint production line is designed for high-volume production. Discover the Aurora production line.

SPECIALS

We can design an imprint machine that meets your unique requirements. Don’t hesitate to contact us for more information.

Morpho Portis: Nanoimprint equipment for R&D and pilot production

We understand the importance of R&D. Especially when you are still investigating the specifications you need to create your ultimate product.

Stand-alone roll-to-plate nanoimprint equipment is ideal for Research and Development, process development and pilot production.

This machine provides ultimate flexibility. After a manual feed-in of the substrate or product, the process is executed automatically and the patterned product can be picked up from the output station.

Separate pre-treatment and coating machines can be supplied by Morphotonics as well, so you can design your perfect R&D installation.

Our stand-alone nanoimprint machine is called the Morpho Portis. One of its offspring is currently located at the Solliance building on the High Tech Campus in Eindhoven the Netherlands.

Imprinting speed in m/min

%

Suited for pilot production

  • Substrate sizes up to 600*1200 mm2
  • Substrate thickness: 0.5 – 10 mm
  • Materials below 0.5 mm thickness (e.g. foils, films) or substrates smaller than 100*460 mm2 can be imprinted by using the included substrate carrier
  • Substrate materials: glass, polymer, metal
  • Textures: from 50 nanometer up to 500 micrometer
  • Imprint speed: up to 10 m/min
  • Easy exchange of flex stamps
  • Removable input and output stations
  • Separate compatible pre-treatment and coating machines
  • Imprinting of markers for easy alignment in downstream equipment
  • Flexstamp development
  • Lacquer with special requirements
  • Substrate carriers

Images of the Morpho Portis

 

 

Aurora: State-of-the-art Nanoimprint Production Line

Integrated roll-to-plate production line designed for high-volume production.

The Aurora line consists of several fully integrated modules. After a manual or automated feed-in of substrates a primer (adhesion-promoter) is applied without touching the substrate. A robot picks up the substrate and transfers it to the imprint module. The advanced substrate table ensures proper alignment and clamping of the substrate. Inkjet printing is used to selectively apply the lacquer at the desired thickness. The flex stamp is rolled onto the substrate with the lacquer in between. By exactly controlling gap and pressure the texture is imprinted while restraining outflow of material. High intensity UVLEDS enable fast curing after which the stamp is delaminated from the imprinted substrate. The stamp returns to the start position, ready for the next imprint. The imprinted substrate is transferred by a robot to an optional post-cure station where potentially uncured edges can be cured in a nitrogen atmosphere. The final alignment station ensures a defined pick-up position for downstream handling equipment.

The Aurora is capable to selectively imprint a substrate. This means that several sharply defined patterned areas can be applied without any lacquer in between.

Changing between products is as easy as changing the flex stamp: this only takes 5 minutes!

Output of GEN3 products per month

Million nanostructures per 1 cm2

  • Substrate dimensions: 550*650 mm2 (GEN3); thickness: 0.3-0.7 mm
  • Textures: from 50 nanometer up to 500 micrometer
  • TACT time: less than 90 seconds
  • Flex stamp exchange time: <5 min
  • Capable of selective imprinting
  • Non-contact primer application
  • Substrate transfer using robots
  • Inkjet printer with Active nozzle control and Nozzle function verification
  • Automated inkjet head maintenance (purging and cleaning)
  • Active stamp-to-substrate alignment
  • Temperature control for dimensional stability
  • Fast curing by UVLEDS
  • Maximum imprint speed: 10 m/min
  • User-friendly software
  • High quality enclosure for clean and UV-safe environment
  • Post-cure station
  • Final alignment station
  • Flexstamp development
  • Lacquer with special requirements
  • Modifications for up- and downstream equipment

Images of the Aurora line

OUR NANOIMPRINT PRODUCTS

 

Imprint machines

From our stand-alone R&D nanoimprint machine called “Morpho Portis”, to our state-of-the-art GEN3 imprint line for mass production.

Imprint stamps

We develop and produce our high-end durable flex stamps ourselves. We assist in optimizing them during the R&D process to fulfill your requirements.

Imprint materials

The performance of your product and nanostructure is highly dependable on the quality of the resin or lacquer that is used for the imprint.

Samples

Together we engineer the best imprinting solutions for your application. We create samples for testing or even custom made prototypes to wow your clients.